Title: Hexamethyldisilazane
CAS Registry Number: 999-97-3
CAS Name: 1,1,1-Trimethyl-N-(trimethylsilyl)silanamine
Additional Names: HMDS
Molecular Formula: C6H19NSi2
Molecular Weight: 161.39
Percent Composition: C 44.65%, H 11.87%, N 8.68%, Si 34.80%
Line Formula: (CH3)3SiNHSi(CH3)3
Literature References: Silylating agent. Prepn: R. O. Sauer, J. Am. Chem. Soc. 66, 1707 (1944). Surface tension and density as a function of temperature: R. S. Myers, H. L. Clever, J. Chem. Eng. Data 14, 161 (1969). Mass spec. study: J. Tamás, P. Miklos, Org. Mass Spectrom. 10, 859 (1975). Raman, IR and NMR spectra: K. Hamada, H. Morishita, Spectrosc. Lett. 16, 717 (1983). Molecular structure and conformation: T. Fjeldberg, J. Mol. Struct. 112, 159 (1984). Use in deactivation of chromatography columns: T. Welsch et al., J. Chromatogr. 241, 41 (1982); R. C. Kong et al., Chromatographia 18, 362 (1984). Use as adhesion promoter for photoresists: J. N. Helbert, H. G. Hughes in Proc. Symp. Adhesion Aspects Polymeric Coatings, K. L. Mittal, Ed. (Plenum Press, New York, 1983) pp 499-508; D. Freeman, W. Kern, J. Vac. Sci. Technol. A 7, 1446 (1989). Physical properties, toxicity and technical data: Petrarch Systems Inc. Product Information Sheets. Brief review of chemistry and applications: R. J. De Pasquale, Am. Lab. 5(6), 35-39 (1973).
Properties: Colorless liquid with an ammonia-like odor. bp 126.0°. d420 0.7742. nD20 1.4080. Flash pt, closed cup: 81°F (27°C). pKa 7.55. Vapor pressure at 50°C: 79 mm. Viscosity: 0.90 cSt. Ignition pt: 380°. Dielectric constant (1000 Hz): 2.27. Insol in water, reacts slowly. LDLO i.p. in mice: 650 mg/kg (Petrarch Systems Inc. Product Information Sheets).
Boiling point: bp 126.0°
Flash point: Flash pt, closed cup: 81°F (27°C)
pKa: pKa 7.55
Index of refraction: nD20 1.4080
Density: d420 0.7742
Toxicity data: LDLO i.p. in mice: 650 mg/kg (Petrarch Systems Inc. Product Information Sheets)
CAUTION: Causes severe burns to eyes and irritation of the skin (Petrarch Systems Inc. Product Information Sheets).
Use: Deactivation of chromatographic support materials. In electronic industry as an adhesion promoter for photoresists on silicon.

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